Pengaruh energi dan dosis ion oksigen pada lapisan tipis SiO2 yang dihasilkan dengan metode implantasi

Aji, Rufisius Sintoko (2004) Pengaruh energi dan dosis ion oksigen pada lapisan tipis SiO2 yang dihasilkan dengan metode implantasi. Skripsi thesis, Sanata Dharma University.

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Item Type: Thesis (Skripsi)
Subjects: Q Science > QC Physics
Divisions: Faculty of Science and Technology > Departement of Physics
Depositing User: Y. Etik Supriyanti
Date Deposited: 08 May 2018 00:54
Last Modified: 08 May 2018 00:54
URI: http://repository.usd.ac.id/id/eprint/25638

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